The Ion Microprobe Facility is equipped with a Cameca ims 4f and a Cameca 1270.

Cameca ims 4f

The ims4f specification is

Mass resolution up to 10,000.
Duoplasmatron ion source for either positive or negative O or Ar ion generation. Additional pumping and gun isolation (IMPVAC Option) has been installed.
Cs microbeam ion source with additional pumping and gun isolation (KISOCMS Option) for the production of Cs+ ions.
Normal incidence electron gun (up-graded Dec99) for charge neutralisation while analysing insulating specimens.
Scanning ion image option for image collection.
Resistive anode encoder for image collection.
Charles Evans and Associates control and interface. The software and interface have been upgraded (March 2003) to the Control-PXT V1.0 running under Windows NT.
ETP Electron Multipliers and ECL fast counting system (14ns dead time) from Pulse-Count Technology Inc.
Sample voltage may be adjusted from 0 to +4500v or 0 to- 4500v, so that the analyses may be made using ultra high offset techniques.
An eight sample air lock system working at a vacuum of 2*10-8 Torr.
Residual gas analyser installed on the sample chamber.

Cameca 1270

Cameca 1270 specification is

Mass resolution up to 40,000.
NMR or Hall probe control of the Magnetic field.
Duoplasmatron ion source for either positive or negative O ion generation with pumping and gun isolation.
Duo-Lens Option (L1) to obtain higher density O ion beam
Cs microbeam ion source with additional pumping and gun isolation for the production of Cs+ ions.
Two sample, fast entry air lock.
Oxygen flooding attachment.
Multi collector option installed with 3 electron multipliers and 4 Faraday cups.
Normal incidence electron gun for charge neutralisation while analysing insulating specimens.
Scanning ion image option for image collection.
Z-stage for adjusting the height of sample.
Turbo molecular pump installed on the multi collector system.

The Facility also has the necessary support equipment:

Sample preparation including impregnation, cutting, grinding and polishing equipment.
Gold and Carbon sputter coaters and a Carbon evaporation coater.
Reflected and transmitted light microscopes with photographic facilities for specimen documentation.
Off-line data translation and processing computers.
Cathodoluminescence microscope in support of ion microprobe applications.
Tencor Instruments Alpha-step 200 depth profiler, for measurement of pit depths.
Access to the Electron Microprobe Facility and the SEM Facility in support of ion microprobe applications.
Access to Zygo surface structure analyser.
A Leybolds UL200 leak detector that is available to other NERC facilities and all Departments at Edinburgh University.